MBE Systems, Sources and Components

Molecular Beam Epitaxy (MBE) is used in applications where thin film single crystals need to be grown, such as for the manufacture of semiconductor devices. MBE offers very low deposition rates (less than 50 nm per minute), which allows epitaxial growth. When performed in ultra-high vacuum (UHV) extremely pure films can be grown.

Edge Shutter

MBE & UHV Accessories
Deposition Sources

Deposition Sources
Complete MBE Systems

Complete MBE Systems

Whether you want to design and built a new system or extent or upgrade your existing setup, we will be able to help you. We offer complete turnkey deposition system for different application areas, individual MBE and e-beam sources for a wide range of materials and temperatures as well as various components, such as shutters, water-cooling, sample heaters, sample manipulators etc. to help with your MBE process.