Atomic Hydrogen Source (HCL)
Atomic hydrogen is very reactive and it allows the cleaning of various substrates like gallium arsenide, indium phosphide, etc. at low temperatures. In addition it can be also used for surfactant growth of epitaxial layers. Molecular hydrogen gas flows through a molybdenum tube passing a hot tungsten filament which is located at the end of this tube and which is heated up to 2500 °C. By this an excellent cracking efficiency of molecular into atomic hydrogen is achieved. Using a high precision valve the hydrogen gas pressure can be directly adjusted. Moreover, with a mass flow controller which is mounted between the hydrogen gas bottle and the leak valve a very accurate pressure control is possible.
Specifications
| Heating system | Radiation heating |
|---|---|
| Temperature range | 200°C … 2500°C |
| Temperature stability | 0.1 K (depending on the PID controller) |
| Max. outgas temp. | 2500°C |
| Max. power | 280W (NW 40 CF) |
| Max. current | 25A |
| Bakeout temperature | 250°C |
| Conditioning | Heat to maximum temperature with or without crucible |
| Shipping | UHV cleaned, in stainless steel container with valve |
Standard Configuration
- Flange size: CF40 / CF63
- Max outer diameter: 38mm or to your specification
- Length: 180mm ... 300mm , or to your specification
- Heating system: Tungsten filament
- Thermocouple: Type C or to your specification
Options
- Molybdenum version
- Tungsten version
- Mass flow controller
Looking for a custom solution? No problem - let us know and we will work with you.
